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ASTEC 2012
ASTEC 2012

ASTEC 2012

Closed
Advanced Surface Technology Exhibition & Conference
Dates: Wednesday, February 15, 2012 - Friday, February 17, 2012
Venue: Tokyo Big Sight, Tokyo, Japan
Concurrent Expo: nano tech 2012 - nano tech International Nanotechnology Exhibition & Conference
Advanced Surface Technology Exhibition & Conference

Materials':'functional nano thin film, gold / silver colloid, conductive materials, insulator thin film, electromagnetic pulse shield materials, organic electro luminescence, photonic crystal, photo catalyst, various catalyst, intelligent materials, biocompatible materials, cell sheet, paints / painting, surface-active agent, water shedding / hydrophilic materials, anti-fouling / anti-bacterium materials, optical barrier film / plastic / coating agent, functional polymer functional monomer / origomer, photonic polymerization initiator, EB hardening ink, plastic for precision machine, paper friction materials, slurry

Surface Processing / Coating /Joint Technology':'water shedding / hydrophilic surface processing, rheology, alumite, plating, blast processing, grinding / polish, CMP,YAG laser welding, embossment, etching, LB film, nano scale barrier film, nano porous membrane, nano lubricating film, DLC coating, ceramics / titanium / fluorine coating, dye / wire bonding, UV / EB photo hardening, friction pressure welding, friction stir joint, normal temperature joint, adhesive / bonding / separation

Products /Electronic Parts':'FED, SED, organic electro luminescence display, flat panel, ink jet, various coating products, photonic switch / sensor various devices, photonic disc, hard disc, contactless IC chip, IC card, hologram, anti-counterfeit / security / attestation various products, magnet, magnetic tape filter, fuel cell, solar battery, thin film lithium ion rechargeable battery

Surface Processing / Manufacturing /Measuring Instruments':'corona / ozone / plasma surface processing instruments, surface tension / shape / roughness measuring instruments, contact angle measuring instruments, rheology-related equipment, anti-static instruments, film thickness measuring instruments, thin film coater, laminating machine, thickness / viscosity various controller, wafer fabrication/ polishing instruments, CVD instruments sputtering / photo resist processing instruments, UV lamp, EB radiation instruments, photolithography machine, EB lithography devices, spin developer, etching devices, ion implantation system, resist separation devices, nano imprint, electron microscope

Website: http://www.astecexpo.jp/en/
Venues
Tokyo Big Sight
3-11-1 Ariake, Koto-ku, Tokyo
Japan
Tel: +81-3-5530-1111
http://www.bigsight.jp/
Organizers
ICS Convention Design, Inc.
Tokyo, Japan, Tokyo
Japan
Tel: +81-3-null
http://english.ics-inc.co.jp/
Future Dates:
ASTEC 20131/30/2013 - 2/1/2013 Tokyo, Japan
ASTEC 20141/29/2014 - 1/31/2014 Tokyo, Japan
ASTEC 20161/27/2016 - 1/29/2016 Tokyo, Japan
ASTEC 20182/14/2018 - 2/16/2018 Tokyo, Japan
ASTEC 20191/30/2019 - 2/1/2019 Tokyo, Japan
ASTEC 20201/29/2020 - 1/31/2020 Tokyo, Japan
ASTEC 20232/1/2023 - 2/3/2023 Tokyo, Japan
ASTEC 20241/31/2024 - 2/2/2024 Tokyo, Japan
ASTEC 2026 Tokyo, Japan
Previous Dates:
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