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| SPIE Photomask Technology 2016 |
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SPIE Photomask Technology 2016 |
Closed
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| 36th Annual SPIE/BACUS Photomask Symposium |
| Dates:
Monday, September 12, 2016 - Wednesday, September 14, 2016
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| Venue: San Jose Convention Center,
San Francisco CA,
United States |
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SPIE Photomask Symposium in Monterey, California is the premier worldwide technical meeting for the photomask industry. In this year we will co-locate and add the Scanning Microscopies conference to join us in the Monterey Conference Center. Attendees will be allowed to attend presentations from both conferences.
The conference will give all attendees an up-to-date overview of the photomask industry. The various sessions will include presentations and poster papers that span a number of critical topics in the photomask industry. These include current technical issues, emerging technologies, and future trends. It will give the authors an opportunity to present their exciting research findings related to the emerging technical challenges facing the photomask industry to a large international audience of their peers. We have received approximately 100 presentations this year, including from the Scanning Microscopies joint contribution, covering all aspects of mask making, mask application, and related technologies.
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Website: http://spie.org/x6323.xml
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